Meeting Demands for Micropatterning
Meeting Demands for Micropatterning
In response to the demand for larger-sized and higher definition LCDs, larger-sized and higher definition photomasks have also been launched. Currently, photomask manufacturers are required to generate high-definition patterns with line widths of several micrometers (1 μm=1/1,000 mm) on a glass substrate sized 1 m2 or larger.
SK-Electronics uses its proprietary pattern generation and process technologies that make it possible to create high-definition patterns within an error range of submicrons. Because these technologies are also applied to electronic devices other than LCDs, we can provide top quality photomasks at reasonable prices at the customer’s request.
At SK-Electronics, we can generate straight patterns on photomasks within an error range of submicrons. This level of precision is equivalent to drawing a 2-km line with a 1 mm deviation between the start and the end points.
Compared to a typical sewing thread with a diameter of approximately 0.2 mm, you can appreciate just how fine a photomask pattern is.
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